Journal of Colloid and Interface Science

Any subject within the realm of colloid and surface science is appropriate for this Advances Journal. Subjects of technological and industrial interest, on the one hand, and those which would normally be considered to fall in the domain of physics, on the other, are included so long as the emphasis is on the fundamentals involved. The subject matter is treated in depth as a review of the current state of the subject area.

Current Opinion in Colloid and Interface Science (COCIS) is an international Journal focussed on the major areas of colloid/interface/polymer science. The journal also encompasses aspects of materials science, industrial applications of colloids, and biologically-relevant systems. COCIS is not a primary journal; rather it seeks to guide the researcher through the maze of current published literature, and to highlight areas and papers which, in the opinion of the reviewers, are of special interest and significance.

This journal establishes a dedicated channel for physicists, material scientists, and chemists, who are interested in organic electronic devices, such as, but not limited to, organic light emitting devices, thin film transistors, photovoltaic cells, etc. The Journal features mainly original research work in experiment, theory and applications.

The journal covers the following areas of research: physics, chemistry, and engineering of materials with applications to organic electronics and optoelectronics.
Papers suitable for publication in this journal cover such topics as the photoconductive and electronic properties of organic materials, film growth and characterization, organic electronic and optoelectronic devices, and applications.

The journal contains invited review papers on the properties of surfaces and interfaces of metals, semiconductors and insulators. The emphasis is on fundamental aspects of solid and liquid interfaces, their atomic and electronic structure. Both theoretical and experimental papers are included.

Publishes original papers dealing with all aspects of vacuum research and technology concerned with an environment in which the total gas pressure is below that of the atmosphere. Particular attention is given to subject areas of major industrial importance including ion implantation, ion plating, plasma processing and thin film processes.